Impact of Process Fluctuations on RF Small-Signal Parameter of Gate-All-Around Nanosheet Transistor Beyond 3 nm Node, IEEE Transactions on Electron Devices, 69(1), 31-38,2022.
上一篇:下一篇:
发布时间:2025-09-05浏览次数:10文章来源:402永利集团
Impact of Process Fluctuations on RF Small-Signal Parameter of Gate-All-Around Nanosheet Transistor Beyond 3 nm Node, IEEE Transactions on Electron Devices, 69(1), 31-38,2022.
地址:地址:闵行区东川路500号,中国,上海
Copyright © 402永利集团(中国区)有限公司-官方网站 版权所有 All rights reserved.